In practical applications, the properties of materials are highly dependent on the complexity of structures that render the necessity for the fabrication of complex polymer brush microstructures. They have been fabricated via several patterning strategies combining with SIP, e.g. electron-beam chemical lithography (EBCL) or electron-beam induced carbon deposition (EBCD). These elegant patterning strategies remain inaccessible to a large number of researchers due to the instrumental expensive complexity required.
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